CMP cleaning fluid is mainly used in the wafer manufacturing process. Overseas companies dominate the global market.

CMP technology, also known as chemical mechanical polishing technology, refers to the technology that uses chemical and mechanical methods to flatten wafers during the wafer manufacturing process. The materials used in CMP technology include CMP cleaning fluid, CMP polishing pad, CMP diamond disc and CMP polishing fluid. CMP cleaning fluid refers to CMP materials that can remove impurities on the wafer surface and improve wafer yield.

​According to different product properties, CMP cleaning fluids can be divided into two categories: alkaline CMP cleaning fluids and acidic CMP cleaning fluids. Alkaline CMP cleaning fluid is made of alkaline surfactants as the base material. It has the characteristics of high selectivity and weak corrosiveness. It is mainly used to remove impurities such as inorganic matter, organic matter, oxides, and dust particles; acidic CMP The cleaning solution is made of acidic surfactant as the base material. It has the advantages of high cleaning efficiency and good solubility, and is suitable for removing metal ions from the wafer surface.

The main components of CMP cleaning fluid include surfactants, polyhydroxy compounds, hydrogen peroxide solution, ammonium hydroxide, amine-containing compounds, phosphoric acid, tetramethylammonium hydroxide, etc. Attracted by the market prospects, global enthusiasm for research and development of CMP cleaning fluids continues to rise, driving the continuous improvement of product types, performance, and quality. However, currently, due to factors such as high technical barriers and high production costs, my country’s high-end CMP cleaning fluids still rely on imports.

According to the “2023-2028 China CMP Cleaning Fluid Industry Market In-depth Research and Development Prospects Forecast Report released by the Industrial Research Center, CMP cleaning fluid is mainly used in the wafer manufacturing process, accounting for nearly 5% of CMP material costs. Wafer is the core material used in silicon semiconductor circuits, and CMP technology is the post-processing link of wafer manufacturing. In recent years, with the accelerated development of high-tech industries, the demand for chips has become increasingly strong. Against this background, the scale of my country’s wafer market has shown a trend of growth year by year. In 2022, the scale of my country’s wafer market will reach nearly 350 billion yuan, setting a record high. Benefiting from the increasing prosperity of the wafer industry, CMP cleaning fluid is an important processing material and its market space continues to expand.

The CMP cleaning fluid industry is highly concentrated, with leading companies occupying a major share of the global market. Anji Technology (Anji), Merck KGaA of Germany, and Entegris of the United States are the main suppliers of CMP cleaning fluids in the world. The above three companies occupy nearly 60% of the global market share. In terms of the local market, Dinglong Co., Ltd. is my country’s leading CMP cleaning fluid company. It focuses on the research and development, production and sales of CMP series products. In 2023, the company’s annual CMP cleaning fluid expansion project of 10,000 tons will be launched in the Xiantao Optoelectronic Semiconductor Materials Industry. The park was completed and put into operation.

Industry analysts said that CMP cleaning fluid is a material used in CMP technology and plays an important role in wafer yield. Benefiting from the improvement in industry prosperity, my country’s CMP cleaning fluid market demand is growing. However, at present, there is still a gap between the quality, output and technical level of my country’s high-end CMP cleaning fluids compared with overseas developed countries. Local companies urgently need to increase investment in research and development to improve their competitiveness.