Hafnium tetrachloride (HfCl4) has huge development potential as a semiconductor precursor. my country’s production capacity needs to be improved.
Hafnium tetrachloride is an inorganic compound with the molecular formula HfCl4. It is a kind of non-metallic crystal. It looks like colorless crystals and can react strongly with water. It is highly hygroscopic and easily hydrolyzed. It is soluble in water, methanol and acetone.
Hafnium tetrachloride is mainly prepared through the chlorination method of chromium powder. It refers to using hafnium oxide, carbon tetrachloride, chlorine, etc. as raw materials, and generates tetrachloride through processes such as crushing, drying, chlorination reaction, and condenser condensation. Hafnium method. Zirconium and hafnium are associated, and the hafnium tetrachloride generated by the chlorination method of chromium powder has a low purity and generally contains a certain amount of zirconium tetrachloride, ferric chloride, titanium tetrachloride and a series of chloride impurities. In the future, driven by the rapid development of the downstream market, the production process of hafnium tetrachloride needs to be continuously upgraded.
Hafnium tetrachloride has a wide range of applications. It can be used as a catalyst in the field of organic synthesis of high molecular weight materials. For example, it can catalyze the polymerization of olefins to prepare various plastics, rubber, fibers and other materials, and catalyze the esterification reaction of alcohols and acids to prepare It can produce various spices, drugs and other compounds; it can be used as chemical raw materials in the field of manufacturing hafnium compounds such as hafnium dioxide and hafnium ammonia complexes, and chromium compounds such as zirconium diboride; it can be used as a precursor in semiconductors, ultra-high temperature ceramics, large-scale Power LED, atomic reactor and other fields. In recent years, driven by the rapid development of the downstream market, the market demand for hafnium tetrachloride has been increasing, and the demand space is relatively broad.
According to the“China Hafnium Tetrachloride (HfCl4) Industry Market Monitoring and Future Development Prospects Research Report 2023-2027” released by the Industrial Research Center 》It shows that according to different uses, hafnium tetrachloride can be divided into industrial grade hafnium tetrachloride and semiconductor grade hafnium tetrachloride. Among them, semiconductor-grade hafnium tetrachloride has high optical properties, mechanical properties, radiation resistance, thermal stability, etc., and is mainly used as hafnium-containing precursors in CVD/ALD processes, such as tetrakis(ethylmethylamino)hafnium (IV) (TEMAH), hafnium alkoxide and other material production scenarios.
At present, the domestic companies that are developing hafnium tetrachloride market mainly include Beijing Xingrongyuan Technology, Shanghai Sanyun Industrial, Beijing Bailingwei Technology, Beijing Forsman Technology, Hunan Huajing Powder Materials, Shenzhen Zhonghafn Technology, and Hunan Huawei Jingcheng Material Technology There are many companies, but most of them are companies that mainly produce industrial-grade hafnium tetrachloride. Semiconductor-grade hafnium tetrachloride has high requirements for purity and impurity content. Currently, only a few domestic companies such as Forsman Technology, Huajing Powder Materials, and Huawei Jingcheng Materials have production capabilities.
Industrial analysts personnel said that hafnium tetrachloride is an important non-metallic crystal material and plays an important role in the chemical industry. , semiconductor, medical, plastic, rubber and other fields are widely used. Under the background of the booming development of the domestic semiconductor industry, the demand for semiconductor-grade hafnium tetrachloride is increasing, but the number of companies with the production capacity of this product is still relatively small. In the future, local companies will need to accelerate the development of key technologies and promote the continuous improvement of semiconductor-grade hafnium tetrachloride production capacity.